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Leaching mechanisms in immersion lithography with or without top coat

Leaching mechanisms in immersion lithography with or without top coat

S. Gaugiran; R. Feilleux; C. Sourd; S. Warrick; V. Farys; D. Cruau; M. Benndorf; B. Mortini
  • 作者S. Gaugiran; R. Feilleux; C. Sourd; S. Warrick; V. Farys; D. Cruau; M. Benndorf; B. Mortini
  • 卷第84卷
  • 印刷ISSN0167-9317
  • 文件大小305.62KB
  • 发表时间2007
  • DOI10.1016/j.mee.2007.01.117
  • 页码1054-1057
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