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Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl<sub>2</sub>-O<sub>2</sub> Thermal Etching

Sloped Sidewalls in 4H-SiC Mesa Structure Formed by a Cl₂-O₂ Thermal Etching

Takenami, S.; Hatayama, Tomoaki; Yano, Hiroshi; Uraoka, Yukiharu; Fuyuki, Takashi

期刊名称Materials Science Forum
作者Takenami, S.; Hatayama, Tomoaki; Yano, Hiroshi; Uraoka, Yukiharu; Fuyuki, Takashi
电子ISSN1662-9752
文件大小421.02KB
发表时间2007
DOI10.4028/www.scientific.net/MSF.556-557.733
页码733-736

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