Residual stress and hardness behaviors of the two-layer C/Si films
- 作者C.K. Chung; C.C. Peng; B.H. Wu; T.S. Chen
- 卷第202卷
- 印刷ISSN0257-8972
- 文件大小680.70KB
- 发表时间2007
- DOI10.1016/j.surfcoat.2007.07.039
- 页码1149-1153
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