Improved stability of intrinsic nanocrystalline Si thin films deposited by hot-wire chemical vapour deposition technique

S. Halindintwali; D. Knoesen; R. Swanepoel; B.A. Julies; C. Arendse; T. Muller; C.C. Theron; A. Gordijn; P.C.P. Bronsveld; J.K. Rath; R.E.I. Schropp

作者S. Halindintwali; D. Knoesen; R. Swanepoel; B.A. Julies; C. Arendse; T. Muller; C.C. Theron; A. Gordijn; P.C.P. Bronsveld; J.K. Rath; R.E.I. Schropp
卷第515卷
印刷ISSN0040-6090
文件大小364.12KB
发表时间2007
DOI10.1016/j.tsf.2007.03.051
页码8040-8044

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