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Effect of Film Thickness on Electrical Properties of Chemical Solution Deposition-Derived Pb(Zr
<sub/><i>x</i>
</sub>
Ti
<sub/>
1-
<i>x</i>
</sub>
)O
<sub/>3</sub>
/LaNiO
<sub/>3</sub>
/Si

Effect of Film Thickness on Electrical Properties of Chemical Solution Deposition-Derived Pb(Zr _x Ti _{1-
x} )O ₃ /LaNiO ₃ /Si

Sakamaki, Yoshihiro; Fukazawa, Hiroaki; Wakiya, Naoki; Suzuki, Hisao; Shinozaki, Kazuo; Ohno, Tomoya; Kosec, Marija

期刊名称Japanese Journal of Applied Physics
作者Sakamaki, Yoshihiro; Fukazawa, Hiroaki; Wakiya, Naoki; Suzuki, Hisao; Shinozaki, Kazuo; Ohno, Tomoya; Kosec, Marija
卷第46卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小338.83KB
发表时间2007-10-22
DOI10.1143/JJAP.46.6925
页码6925-6928

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