发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Study of La-Induced Flat Band Voltage Shift in Metal/HfLaO
<sub/><i>x</i>
</sub>
/SiO
<sub/>2</sub>
/Si Capacitors

Study of La-Induced Flat Band Voltage Shift in Metal/HfLaO _x /SiO ₂ /Si Capacitors

Yamamoto, Yoshiki; Kita, Koji; Kyuno, Kentaro; Toriumi, Akira

期刊名称Japanese Journal of Applied Physics
作者Yamamoto, Yoshiki; Kita, Koji; Kyuno, Kentaro; Toriumi, Akira
卷第46卷
期第11期
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小185.99KB
发表时间2007-11-6
DOI10.1143/JJAP.46.7251
页码7251-7255

← 返回【学霸图书馆】主页