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Preparation of an Ultraclean and Atomically Controlled Hydrogen-Terminated Si(111)-(1× 1) Surface Revealed by High Resolution Electron Energy Loss Spectroscopy, Atomic Force Microscopy, and Scanning Tunneling Microscopy: Aqueous NH4F Etching Process of Si(111)

Preparation of an Ultraclean and Atomically Controlled Hydrogen-Terminated Si(111)-(1× 1) Surface Revealed by High Resolution Electron Energy Loss Spectroscopy, Atomic Force Microscopy, and Scanning Tunneling Microscopy: Aqueous NH4F Etching Process of Si(111)

H. Kato; T. Taoka; S. Nishikata; G. Sazaki; T. Yamada; R. Czajka; A. Wawro; K. Nakajima; A. Kasuya; S. Suto
  • 作者H. Kato; T. Taoka; S. Nishikata; G. Sazaki; T. Yamada; R. Czajka; A. Wawro; K. Nakajima; A. Kasuya; S. Suto
  • 文件大小263.55KB
  • 发表时间2007
  • DOI10.1143/JJAP.46.5701
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