Transmission Electron Microscopy of TiW/Ti/Pt/Au Gate Metallizations for InAs Channel High Electron Mobility Transistors
- 期刊名称Microscopy and Microanalysis
- 作者Zhang, Q; Dormaier, R; Buehl, T; Liu, B; Mohney, S
- 卷第13卷
- 印刷ISSN1431-9276
- 电子ISSN1435-8115
- 文件大小752.85KB
- 发表时间2007-8
- DOI10.1017/s1431927607078129
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