SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Resist evaluation for contact hole patterning with thermal flow process
Tiron, R.; Lin, Qinghuang; Petitdidier, C.; Sourd, C.; De Simone, D.; Cotti, G.; Annoni, E.; Mortini, B.
- 作者Tiron, R.; Lin, Qinghuang; Petitdidier, C.; Sourd, C.; De Simone, D.; Cotti, G.; Annoni, E.; Mortini, B.
- 卷第6519卷
- 印刷ISSN0277-786X
- 文件大小436.92KB
- 发表时间2007
- DOI10.1117/12.711678