Structural and surface properties of Si1−xGex thin films obtained by reduced pressure CVD
- 作者R.C. Teixeira; I. Doi; J.A. Diniz; J.W. Swart; M.B.P. Zakia
- 卷第254卷
- 期第1期
- 印刷ISSN0169-4332
- 文件大小585.15KB
- 发表时间2007
- DOI10.1016/j.apsusc.2007.07.032
- 页码207-212
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