Anisotropy of chemical mechanical polishing in silicon carbide substrates

• 作者Xiu-Fang Chen; Xian-Gang Xu; Xiao-Bo Hu; Juan Li; Shou-Zhen Jiang; Li-Na Ning; Ying-Min Wang; Min-Hua Jiang
• 卷第142卷
• 期第1期
• 印刷ISSN0921-5107
• 文件大小697.43KB
• 发表时间2007
• DOI10.1016/j.mseb.2007.06.015
• 页码28-30