Dependences of structural and electrical properties on thickness of polycrystalline Ga-doped ZnO thin films prepared by reactive plasma deposition
- 作者T. Yamada; T. Nebiki; S. Kishimoto; H. Makino; K. Awai; T. Narusawa; T. Yamamoto
- 卷第42卷
- 印刷ISSN0749-6036
- 电子ISSN1096-3677
- 文件大小379.09KB
- 发表时间2007
- DOI10.1016/j.spmi.2007.04.080
- 页码68-73
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