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High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method

High diffusion length silicon germanium alloy thin films deposited by pulsed rf PECVD method

Partha Chaudhuri; Ayana Bhaduri; Atul Bandyopadhyay; Stephane Vignoli; Partha Pratim Ray; Christophe Longeaud
  • 作者Partha Chaudhuri; Ayana Bhaduri; Atul Bandyopadhyay; Stephane Vignoli; Partha Pratim Ray; Christophe Longeaud
  • 卷第354卷
  • 印刷ISSN0022-3093
  • 文件大小390.73KB
  • 发表时间2008
  • DOI10.1016/j.jnoncrysol.2007.09.077
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