A combined ab initio and Franck–Condon factor simulation study on the photodetachment spectrum of HfO2−
- 期刊名称Physical Chemistry Chemical Physics
- 作者Mok, Daniel K. W.; Lee, Edmond P. F.; Chau, Foo-tim; Dyke, John M.
- 卷第10卷
- 期第48期
- 印刷ISSN1463-9076
- 电子ISSN1463-9084
- 文件大小570.11KB
- 发表时间2008
- DOI10.1039/b809863h
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