[IEEE 2008 IEEE 21st International Conference on Micro Electro Mechanical Systems - Tucson, AZ, USA (2008.01.13-2008.01.17)] 2008 IEEE 21st International Conference on Micro Electro Mechanical Systems - Contact potential difference for sequential assembly and face alignment of submillimeter components
Tanemura, T.; Higuchi, Y.; Kusakabe, T.; Sugano, K.; Tsuchiya, T.; Tabata, O.
- 作者Tanemura, T.; Higuchi, Y.; Kusakabe, T.; Sugano, K.; Tsuchiya, T.; Tabata, O.
- 文件大小792.77KB
- 发表时间2008
- DOI10.1109/memsys.2008.4443841
- 页码1056-1059