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W chemical-vapor deposition using (i-C[sub 3]H[sub 7]C[sub 5]H[sub 4])[sub 2]WH[sub 2]

W chemical-vapor deposition using (i-C[sub 3]H[sub 7]C[sub 5]H[sub 4])[sub 2]WH[sub 2]

Ogura, Atsushi; Imai, Satoshi; Kagawa, Taihei; Kurozaki, Hirotaka; Ishikawa, Masato; Muramoto, Ikuyo; Machida, Hideaki; Ohshita, Yoshio
  • 期刊名称Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
  • 作者Ogura, Atsushi; Imai, Satoshi; Kagawa, Taihei; Kurozaki, Hirotaka; Ishikawa, Masato; Muramoto, Ikuyo; Machida, Hideaki; Ohshita, Yoshio
  • 卷第26卷
  • 期第4期
  • 印刷ISSN0734-2101
  • 文件大小458.22KB
  • 发表时间2008
  • DOI10.1116/1.2913581
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