Enhancement of Acid Production in Chemically Amplified Resist for Extreme Ultraviolet Lithography
- 期刊名称Applied Physics Express
- 作者Yamamoto, Hiroki; Kozawa, Takahiro; Tagawa, Seiichi; Yukawa, Hiroto; Sato, Mitsuru; Onodera, Junichi
- 卷第1卷
- 印刷ISSN1882-0778
- 电子ISSN1882-0786
- 文件大小116.73KB
- 发表时间2008-3-21
- DOI10.1143/APEX.1.047001
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