Electron weak localization, and electron–phonon interaction in amorphous zinc-doped indium oxide films
- 作者K. Makise; M. Funaki; B. Shinozaki; K. Yano; Y. Shimane; K. Inoue; H. Nakamura
- 卷第516卷
- 期第17期
- 印刷ISSN0040-6090
- 文件大小422.44KB
- 发表时间2008
- DOI10.1016/j.tsf.2007.10.037
- 页码5805-5808
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