Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication
Kozawa, Takahiro; Tagawa, Seiichi; Santillan, Julius Joseph; Toriumi, Minoru; Itani, Toshiro
- 期刊名称Japanese Journal of Applied Physics
- 作者Kozawa, Takahiro; Tagawa, Seiichi; Santillan, Julius Joseph; Toriumi, Minoru; Itani, Toshiro
- 卷第47卷
- 期第6期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小144.47KB
- 发表时间2008-6-13
- DOI10.1143/JJAP.47.4465
- 页码4465-4468