SPIE Proceedings [SPIE 4th International Symposium on Advanced Optical Manufacturing and testing Technologies: Large Mirrors and Telescopes - Chengdu, China (Wednesday 19 November 2008)] 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes - Evolution of wavelength shrinkage in lithography
Jiang, Wenhan; Kameyama, Masaomi; McCallum, Martin; Geyl, Roland; Cho, Myung K.; Owa, Soichi; Wu, Fan
- 作者Jiang, Wenhan; Kameyama, Masaomi; McCallum, Martin; Geyl, Roland; Cho, Myung K.; Owa, Soichi; Wu, Fan
- 卷第7281卷
- 印刷ISSN0277-786X
- 文件大小169.03KB
- 发表时间2008
- DOI10.1117/12.831424