The effect of silicon crystallographic orientation on the formation of silicon nanoclusters during anodic electrochemical etching

• 作者D. F. Timokhov; F. P. Timokhov
• 卷第43卷
• 期第1期
• 印刷ISSN1063-7826
• 电子ISSN1090-6479
• 文件大小180.51KB
• 发表时间2009-01
• DOI10.1134/s1063782609010175
• 页码88-91