In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography
- 作者Tay, A.; Weng Khuen Ho; Xiaodong Wu; Xiaoqi Chen
- 卷第58卷
- 期第12期
- 印刷ISSN0018-9456
- 电子ISSN1557-9662
- 文件大小810.00KB
- 发表时间2009
- DOI10.1109/tim.2009.2021620
- 页码3978-3984
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