Rigorous Extraction of Process Variations for 65-nm CMOS Design
Zhao, Wei; Liu, Frank; Agarwal, Kanak; Acharyya, Dhruva; Nassif, Sani R.; Nowka, Kevin J.; Cao, Yu
- 期刊名称IEEE Transactions on Semiconductor Manufacturing
- 作者Zhao, Wei; Liu, Frank; Agarwal, Kanak; Acharyya, Dhruva; Nassif, Sani R.; Nowka, Kevin J.; Cao, Yu
- 卷第22卷
- 期第1期
- 印刷ISSN0894-6507
- 文件大小1233.03KB
- 发表时间2009-02
- DOI10.1109/TSM.2008.2011182
- 页码196-203