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Dielectric barrier discharge plasma treatment on E. coli: Influence of CH[sub 4]/N[sub 2], O[sub 2], N[sub 2]/O[sub 2], N[sub 2], and Ar gases

Dielectric barrier discharge plasma treatment on E. coli: Influence of CH[sub 4]/N[sub 2], O[sub 2], N[sub 2]/O[sub 2], N[sub 2], and Ar gases

Majumdar, Abhijit; Singh, Rajesh Kumar; Palm, Gottfried J.; Hippler, Rainer

期刊名称Journal of Applied Physics
作者Majumdar, Abhijit; Singh, Rajesh Kumar; Palm, Gottfried J.; Hippler, Rainer
卷第106卷
期第8期
印刷ISSN0021-8979
文件大小538.44KB
发表时间2009
DOI10.1063/1.3236570

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