Studies of the Photo Acid Generator Material Design for Chemically Amplified Photoresists
- 期刊名称Japanese Journal of Applied Physics
- 作者Utsumi, Yoshiyuki; Seshimo, Takehiro; Komuro, Yoshitaka; Kawaue, Akiya; Ishiduka, Keita; Matsuzawa, Kensuke; Hada, Hideo; Onodera, Junichi
- 卷第48卷
- 期第6期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小262.57KB
- 发表时间2009-6-22
- DOI10.1143/jjap.48.06fc07
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