Iron diffusion in silicon under external stress
- 作者K. Suzuki; Y. Yoshida; T. Kamimura; M. Ichino; K. Asahi
- 卷第404卷
- 印刷ISSN0921-4526
- 文件大小214.63KB
- 发表时间2009
- DOI10.1016/j.physb.2009.08.188
- 页码4678-4680
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