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Characterization of chemical sputtering using the Mark II DiMES porous plug injector in attached and semi-detached divertor plasmas of DIII-D

Characterization of chemical sputtering using the Mark II DiMES porous plug injector in attached and semi-detached divertor plasmas of DIII-D

A.G. McLean; J.W. Davis; P.C. Stangeby; S.L. Allen; J.A. Boedo; B.D. Bray; S. Brezinsek; N.H. Brooks; M.E. Fenstermacher; M. Groth; A.A. Haasz; E.M. Hollmann; R.C. Isler; C.J. Lasnier; Y. Mu; T.W. Petrie; D.L. Rudakov; J.G. Watkins; W.P. West; D.G. Whyte; C.P.C. Wong
  • 作者A.G. McLean; J.W. Davis; P.C. Stangeby; S.L. Allen; J.A. Boedo; B.D. Bray; S. Brezinsek; N.H. Brooks; M.E. Fenstermacher; M. Groth; A.A. Haasz; E.M. Hollmann; R.C. Isler; C.J. Lasnier; Y. Mu; T.W. Petrie; D.L. Rudakov; J.G. Watkins; W.P. West; D.G. Whyte; C.P.C. Wong
  • 印刷ISSN0022-3115
  • 文件大小569.67KB
  • 发表时间2009
  • DOI10.1016/j.jnucmat.2009.01.157
  • 页码160-163
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