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Development of SiO2 Dielectric Thin Film Prepared by the Low-temperature Solution Process

Development of SiO2 Dielectric Thin Film Prepared by the Low-temperature Solution Process

Kodzasa, Takehito; Uemura, Sei; Suemori, Kouji; Yoshida, Manabu; Hoshino, Satoshi; Takada, Noriyuki; Kamata, Toshihide
  • 期刊名称MRS Proceedings
  • 作者Kodzasa, Takehito; Uemura, Sei; Suemori, Kouji; Yoshida, Manabu; Hoshino, Satoshi; Takada, Noriyuki; Kamata, Toshihide
  • 卷第1196卷
  • 电子ISSN1946-4274
  • 文件大小638.51KB
  • 发表时间2009-1
  • DOI10.1557/PROC-1196-C04-04
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