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Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

Plasma-Enhanced Atomic Layer Deposition of TiO[sub 2] and Al-Doped TiO[sub 2] Films Using N[sub 2]O and O[sub 2] Reactants

Choi, Gyu-Jin; Kim, Seong Keun; Won, Seok-Jun; Kim, Hyeong Joon; Hwang, Cheol Seong
  • 期刊名称Journal of The Electrochemical Society
  • 作者Choi, Gyu-Jin; Kim, Seong Keun; Won, Seok-Jun; Kim, Hyeong Joon; Hwang, Cheol Seong
  • 卷第156卷
  • 期第9期
  • 印刷ISSN0013-4651
  • 文件大小1110.41KB
  • 发表时间2009
  • DOI10.1149/1.3169516
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