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Erratum to “Al2O3 thin film growth on Si (100) using binary reaction sequence chemistry” [Thin Solid Films 292 (1997) 135–144]

Erratum to “Al2O3 thin film growth on Si (100) using binary reaction sequence chemistry” [Thin Solid Films 292 (1997) 135–144]

A.W. Ott; J.W. Klaus; J.M. Johnson; S.M. George

作者A.W. Ott; J.W. Klaus; J.M. Johnson; S.M. George
卷第517卷
期第20期
印刷ISSN0040-6090
文件大小73.65KB
发表时间2009
DOI10.1016/j.tsf.2009.01.027

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