SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - <title>Flare impact on the intrafield CD control for sub-0.25-μm patterning</title>Luce, Emmanuelle; Minghetti, Blandine; Schiavone, Patrick; Toublan, Olivier; Weill, Andre P.; Van den Hove, Luc · 1999

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - <title>Application of a new approach to optical proximity correction</title>Rosenbusch, Anja; Hourd, Andrew C.; Juffermans, Casper A. H.; Kirsch, Hartmut; Lalanne, Frederic P.; Maurer, Wilhelm; Romeo, Carmelo; Ronse, Kurt G.; Schiavone, Patrick; Simecek, Michal; Toublan, Olivier; Vermeulen, Tom; Watson, John G.; Ziegler, Wolfram; Zimmermann, Rainer; Van den Hove, Luc · 1999