SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - A new optical measurement method for verifying the exact change of thin films on the QZ blanks with ellipsometer
Moon, Songbae; Hosono, Kunihiro; Kim, Seong-Yoon; Bang, Gyung-Yoon; Kim, Byung-Gook; Woo, Sang-Gyun; Cho, Han-ku
- 作者Moon, Songbae; Hosono, Kunihiro; Kim, Seong-Yoon; Bang, Gyung-Yoon; Kim, Byung-Gook; Woo, Sang-Gyun; Cho, Han-ku
- 卷第7379卷
- 印刷ISSN0277-786X
- 文件大小292.51KB
- 发表时间2009
- DOI10.1117/12.824315