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Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer

Stress engineering of the alkoxide derived ferroelectric thin film on Si wafer

OHNO, Tomoya; MALIČ, Babara; FUKAZAWA, Hiroaki; WAKIYA, Naoki; SUZUKI, Hisao; MATSUDA, Takeshi; KOSEC, Marija
  • 期刊名称Journal of the Ceramic Society of Japan
  • 作者OHNO, Tomoya; MALIČ, Babara; FUKAZAWA, Hiroaki; WAKIYA, Naoki; SUZUKI, Hisao; MATSUDA, Takeshi; KOSEC, Marija
  • 卷第117卷
  • 期第1370期
  • 印刷ISSN1882-0743
  • 电子ISSN1348-6535
  • 文件大小728.33KB
  • 发表时间2009
  • DOI10.2109/jcersj2.117.1089
  • 页码1089-1094
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