The effect of Ar flow rate in the growth of SiGe:H thin films by PECVD

• 作者Zeguo Tang; Wenbin Wang; Desheng Wang; Dequan Liu; Qiming Liu; Min Yin; Deyan He
• 卷第256卷
• 期第23期
• 印刷ISSN0169-4332
• 文件大小363.99KB
• 发表时间2010
• DOI10.1016/j.apsusc.2010.05.019
• 页码7032-7036