Fabrication and annealing effects of SnO2/SiOx nanocables sheathed by the sputtering technique

• 作者Hyoun Woo Kim; Seung Hyun Shim; Jong Woo Lee; Hyo Sung Kim; Mesfin Abayneh Kebede; Han Gil Na; Ju Chan Yang; Myung Ho Kong; Chongmu Lee
• 卷第10卷
• 期第1期
• 印刷ISSN1567-1739
• 文件大小537.33KB
• 发表时间2010
• DOI10.1016/j.cap.2009.04.009
• 页码47-51