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Chloride-Based CVD at High Growth Rates on 3” Vicinal Off-Angles SiC Wafers

Chloride-Based CVD at High Growth Rates on 3” Vicinal Off-Angles SiC Wafers

Leone, Stefano; Henry, Anne; Kordina, Olle; Janzén, Erik

期刊名称Materials Science Forum
作者Leone, Stefano; Henry, Anne; Kordina, Olle; Janzén, Erik
电子ISSN1662-9752
文件大小486.39KB
发表时间2010-4
DOI10.4028/www.scientific.net/MSF.645-648.107
页码107-110

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