SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Selective inverse lithography methodology
- 作者Lim, ChinTeong; Temchenko, Vlad; Niehoff, Martin; Dusa, Mircea V.; Conley, Will
- 卷第7640卷
- 印刷ISSN0277-786X
- 文件大小793.35KB
- 发表时间2010
- DOI10.1117/12.845464