Minimizing 6-fold Symmetry and Chromatic Aberration by Using Ultra High Resolution Lens in Cs-Corrected STEM
- 期刊名称Microscopy and Microanalysis
- 作者Nakamura, K; Inada, H; Konno, M; Suzuki, Y; Kimoto, K
- 卷第16卷
- 印刷ISSN1431-9276
- 电子ISSN1435-8115
- 文件大小428.64KB
- 发表时间2010-7
- DOI10.1017/s1431927610056400
- 页码136-137
Image analysis and simulation software in transmission electron microscopyStadelmann, P · Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada · 2003
Surface Microanalysis with Slow ElectronsBauer, Ernst G. · Microscopy and Microanalysis · 2006
Scientific ProgramMicroscopy and Microanalysis · 2008
Nanogenerators and NanopiezotronicsWang, ZL · Microscopy and Microanalysis · 2009
Trichomonads under MicroscopyBenchimol, Marlene · Microscopy and Microanalysis · 2004
Electron Microscopic Studies with GrapheneMeyer, J; Chuvilin, A; Kaiser, U · Microscopy and Microanalysis · 2009
Stress Whitening Morphology of Multiphase PolypropyleneWestphal, S · Microscopy and Microanalysis · 2006
Aberration-Corrected Lorentz MicroscopyNuhfer, NT; Budruk, A; De Graef, M · Microscopy and Microanalysis · 2010