SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Source mask optimization for advanced lithography nodes

Poonawala, Amyn; Dusa, Mircea V.; Conley, Will; Stanton, William; Sawh, Chander

作者Poonawala, Amyn; Dusa, Mircea V.; Conley, Will; Stanton, William; Sawh, Chander
卷第7640卷
印刷ISSN0277-786X
文件大小778.71KB
发表时间2010
DOI10.1117/12.846783

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