![SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Resist process applications to improve EUV patterning]()
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Extreme Ultraviolet (EUV) Lithography IV - Resist process applications to improve EUV patterningPetrillo, Karen; Naulleau, Patrick P.; Cho, Kyoungyoung; Friz, Alexander; Montgomery, Cecilia; Ashworth, Dominic; Neisser, Mark; Wurm, Stefan; Saito, Takashi; Huli, Lior; Ko, Akiteru; Metz, Andrew · 2013