Radiation Chemistry in Chemically Amplified Resists
- 期刊名称Japanese Journal of Applied Physics
- 作者Kozawa, Takahiro; Tagawa, Seiichi
- 卷第49卷
- 期第3期
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1043.99KB
- 发表时间2010-3-23
- DOI10.1143/JJAP.49.030001
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