Ablation of silicon suboxide thin layers
- 作者M. Jahn; J. Richter; R. Weichenhain-Schriever; J. Meinertz; J. Ihlemann
- 卷第101卷
- 期第3期
- 印刷ISSN0947-8396
- 电子ISSN1432-0630
- 文件大小1637.08KB
- 发表时间2010-11
- DOI10.1007/s00339-010-5892-9
- 页码533-538
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