ChemInform Abstract: Access to Highly Fluorinated Silica by Direct F2 Fluorination
Alain Demourgues; Emilie Lataste; Etienne Durand; Alain Tressaud
- 作者Alain Demourgues; Emilie Lataste; Etienne Durand; Alain Tressaud
- 卷第42卷
- 期第17期
- 印刷ISSN0931-7597
- 电子ISSN1522-2667
- 文件大小17.84KB
- 发表时间2011
- DOI10.1002/chin.201117210