Improved Electrical Stability in the Al Doped ZnO Thin-Film-Transistors Grown by Atomic Layer Deposition
- 期刊名称Journal of The Electrochemical Society
- 作者Ahn, Cheol Hyoun; Kong, Bo Hyun; Kim, Hyoungsub; Cho, Hyung Koun
- 卷第158卷
- 期第2期
- 印刷ISSN0013-4651
- 文件大小681.79KB
- 发表时间2011
- DOI10.1149/1.3525278
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