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Subsurface Incorporation of Co Atoms into Si(100)

Subsurface Incorporation of Co Atoms into Si(100)

Choi, Junghun; Kim, Youngwoo; Lim, Do Kyung; Kim, Do Hwan; Kim, Sehun

期刊名称The Journal of Physical Chemistry C
作者Choi, Junghun; Kim, Youngwoo; Lim, Do Kyung; Kim, Do Hwan; Kim, Sehun
卷第115卷
期第31期
印刷ISSN1932-7447
电子ISSN1932-7455
文件大小4357.12KB
发表时间2011-08-11
DOI10.1021/jp2037872
页码15467-15470

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