[IEEE 2011 International Semiconductor Device Research Symposium (ISDRS) - College Park, MD, USA (2011.12.7-2011.12.9)] 2011 International Semiconductor Device Research Symposium (ISDRS) - Room temperature Plasma Assisted Atomic Layer Deposition Al2O3 film's encapsulation application in Organic Light Emitting Diodes

• 作者Fu, Richard; Chen, Andrew; Srour, Merric; Blomquist, Steven; Forsythe, Eric; Shi, Jianmin; Morton, David
• 文件大小278.43KB
• 发表时间2011
• DOI10.1109/isdrs.2011.6135215
• 页码1-2