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[IEEE 2011 12th International Conference on Ultimate Integration on Silicon (ULIS) - Cork, Ireland (2011.03.14-2011.03.16)] Ulis 2011 Ultimate Integration on Silicon - Two-dimensional carrier mapping at the nanometer-scale on 32nm node targeted p-MOSFETs using high vacuum scanning spreading resistance microscopy

[IEEE 2011 12th International Conference on Ultimate Integration on Silicon (ULIS) - Cork, Ireland (2011.03.14-2011.03.16)] Ulis 2011 Ultimate Integration on Silicon - Two-dimensional carrier mapping at the nanometer-scale on 32nm node targeted p-MOSFETs using high vacuum scanning spreading resistance microscopy

Eyben, Pierre; Clarysse, Trudo; Mody, Jay; Nazir, Aftab; Schulze, Andreas; Hantschel, Thomas; Vandervorst, Wilfried
  • 作者Eyben, Pierre; Clarysse, Trudo; Mody, Jay; Nazir, Aftab; Schulze, Andreas; Hantschel, Thomas; Vandervorst, Wilfried
  • 文件大小154.52KB
  • 发表时间2011
  • DOI10.1109/ulis.2011.5758008
  • 页码1-4
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