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Preparation of RPSL-01 Type Photosensitive Resin for Stereolithography and Study on its some Properties

Preparation of RPSL-01 Type Photosensitive Resin for Stereolithography and Study on its some Properties

Huang, Bi Wu; Weng, Zi Xiang; Liu, Shi Min; Chen, Wei Qing

期刊名称Advanced Materials Research
作者Huang, Bi Wu; Weng, Zi Xiang; Liu, Shi Min; Chen, Wei Qing
电子ISSN1662-8985
文件大小662.06KB
发表时间2011-7
DOI10.4028/www.scientific.net/AMR.287-290.386
页码386-389

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