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Influence of process parameters on structure and optical properties of GeC thin films deposited by RF magnetron sputtering

Influence of process parameters on structure and optical properties of GeC thin films deposited by RF magnetron sputtering

C.N. Zoita; C.E.A. Grigorescu; I.C. Vasiliu; I.D. Feraru

作者C.N. Zoita; C.E.A. Grigorescu; I.C. Vasiliu; I.D. Feraru
卷第519卷
期第12期
印刷ISSN0040-6090
文件大小411.29KB
发表时间2011
DOI10.1016/j.tsf.2011.01.204
页码4101-4104

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