Atomically Controlled Processing in Silicon-Based CVD Epitaxial Growth
- 期刊名称Journal of Nanoscience and Nanotechnology
- 作者Murota, Junichi; Sakuraba, Masao; Tillack, Bernd
- 卷第11卷
- 期第9期
- 印刷ISSN1533-4880
- 电子ISSN1533-4899
- 文件大小1497.16KB
- 发表时间2011-09-01
- DOI10.1166/jnn.2011.5052
- 页码8348-8353
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